q to manage “EUV” masks and “EUV” reticles created for built-in circuits, not specified by 3B001.g, and possessing a mask “substrate blank” specified by 3B001.j.” A specialized Take note is included to clarify that masks or reticles having a mounted pellicle are regarded masks and reticles. Aidez-nous à protéger Glassdoor en confir